Deposition and Characterization of ZnO Thin Films by Thermal Vacuum Thermal Evaporation Method for Photoconductive Sensor Application

Arun Dev Dhar Dwivedi; Sumit Vyas; Shaivalini Singh

International Journal of Microelectronics and Digital integrated circuits

Deposition and Characterization of ZnO Thin Films by Thermal Vacuum Thermal Evaporation Method for Photoconductive Sensor Application

Abstract

In this work we have deposited ZnO thin films using thermal evaporation method. The films have been deposited on silicon substrate for structural characterization and on glass substrate for optical characterization. The structural, surface morphology, optical properties and electrical properties of ZnO thin films were investigated systematically using X-ray diffractometer (XRD), scanning electron microscope (SEM), atomic force microscopy (AFM), ellipsometeric measurement and semiconductor parameter analyzer respectively. The deposited ZnO thin films exhibit polycrystalline nature with hexagonal wurtize structure. The surface of the films was composed of uniform grains and band gap was estimated around 3.19 eV. The electrical characterization of the Al/ZnO thin films contacts revealed that the ohmic contact fabricated by a simple and inexpensive method can be used for fabrication of photoconductive sensors applications. Keywords: RF sputtering, scanning electron microscopy, thermal oxidation, X-ray diffractometer, ZnO thin films

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How to cite

Arun Dev Dhar Dwivedi, Sumit Vyas, Shaivalini Singh. Deposition and Characterization of ZnO Thin Films by Thermal Vacuum Thermal Evaporation Method for Photoconductive Sensor Application. International Journal of Microelectronics and Digital integrated circuits. 2016;2(1):1–7.

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Deposition and Characterization of ZnO Thin Films by Thermal Vacuum Thermal Evaporation Method for Photoconductive Sensor Application

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